Log-derivative matching method for pattern comparison

Yasuko Takahashi; Hisako Tanaka; Akio Shio; Sakuichi Ohtsuka

doi:10.1117/12.334748

28 December 1998 Log-derivative matching method for pattern comparison

Yasuko Takahashi, Hisako Tanaka, Akio Shio, Sakuichi Ohtsuka

Proceedings Volume 3653, Visual Communications and Image Processing '99; (1998) https://doi.org/10.1117/12.334748
Event: Electronic Imaging '99, 1999, San Jose, CA, United States

Abstract

A new pattern comparison method called LDM (log-derivative- matching) based on the calculus of object reflectance is proposed. We introduce a log-derivative operator for the local operator, and correlation for global integration. We show two facts about LDM: (1) Under a few assumptions on illumination change, our log-derivative operator minimizes the influence of illuminaton. (2) The LDM method can be used for pattern comparison. Experimental results and also a mathematical analysis show that the proposed method permits pattern matching even under strong shadow.

Citation Download Citation

Yasuko Takahashi, Hisako Tanaka, Akio Shio, and Sakuichi Ohtsuka "Log-derivative matching method for pattern comparison", Proc. SPIE 3653, Visual Communications and Image Processing '99, (28 December 1998); https://doi.org/10.1117/12.334748

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