EUCLIDES: the European EUVL program

Jozef P. H. Benschop; Winfried M. Kaiser; David C. Ockwell

doi:10.1117/12.351165

25 June 1999 EUCLIDES: the European EUVL program

Jozef P. H. Benschop, Winfried M. Kaiser, David C. Ockwell

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351165
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

A new European research program named EUCLIDES (Extreme UV Concept Lithography Development System) has been started in August 1998. The program headed by ASM Lithography (ASML), partnered by Carl Zeiss and Oxford Instruments, is evaluating EUVL as a viable lithographic solution for resolutions of 70 nm and below. This paper gives an overview of program objectives and status, including a summary of recent highlights.

Citation Download Citation

Jozef P. H. Benschop, Winfried M. Kaiser, and David C. Ockwell "EUCLIDES: the European EUVL program", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351165

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