Real-time methodologies for monitoring airborne molecular contamination in modern DUV photolithography facilities

Oleg P. Kishkovich; Devon A. Kinkead; John K. Higley; Robert Kirwin; John Piatt

doi:10.1117/12.350824

14 June 1999 Real-time methodologies for monitoring airborne molecular contamination in modern DUV photolithography facilities

Oleg P. Kishkovich, Devon A. Kinkead, John K. Higley, Robert Kirwin, John Piatt

Author Affiliations +

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350824
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

In this paper, the authors discuss the critical airborne molecular contaminants found in DUV photolithography facilities. They present an overview of real-time monitoring methodologies that can detect and measure these contaminants at low concentrations, enabling users to anticipate and resolve AMC challenges before production problems can result. Citing actual examples of how real-time monitoring is being employe din production fabs, the authors examine single point investigate and multi-point process monitoring strategies, compare the different monitoring strategies, compare the different monitoring technologies now is use, and describe critical points to monitor in tracks, steppers, clean rooms, and air filtration systems. As a separate item, the authors describe an innovative, practical approach to quantifying resist environment sensitivity. It is anticipated this work will result in a standard methodology that can be used at individual process sites to determine the resist sensitivity to airborne molecular contamination under local operating conditions.

Citation Download Citation

Oleg P. Kishkovich, Devon A. Kinkead, John K. Higley, Robert Kirwin, and John Piatt "Real-time methodologies for monitoring airborne molecular contamination in modern DUV photolithography facilities", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350824

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available