Excimer-laser-induced absorption in fused silica

Johannes Moll; Paul M. Schermerhorn

doi:10.1117/12.354319

26 July 1999 Excimer-laser-induced absorption in fused silica

Johannes Moll, Paul M. Schermerhorn

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354319
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Excimer laser radiation changes the physical and optical properties of fused silica. These changes include compaction of the glass and induced absorption, both of which have an impact on the expected lifetime of silica lenses used in optical microlithography. We report on our ongoing study of excimer laser induced changes in fused silica. We use a fully automated experimental setup designed for marathon exposure of the sample at low fluence. In each setup, using either an ArF or a KrF laser, up to five samples are exposed simultaneously and their induced absorption is measured in situ. The spatial and temporal profiles of the laser beam can also be measured in the same setup. We present and discuss results from marathon test of fused silica at fluences close to the conditions expected in optical microlithography systems.

Citation Download Citation

Johannes Moll and Paul M. Schermerhorn "Excimer-laser-induced absorption in fused silica", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354319

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