Paper
23 April 1999 Practical issues in the deployment of a run-to-run control system in a semiconductor manufacturing facility
Jerry A. Stefani, Mike Anderson
Author Affiliations +
Proceedings Volume 3742, Process and Equipment Control in Microelectronic Manufacturing; (1999) https://doi.org/10.1117/12.346250
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom
Abstract
ProcessWORKS, a factory-level run-to-run control architecture, originally developed at Texas Instruments and now a product of Adventa Control Technologies, can treat complex control problems in an automated, predictable, and repeatable fashion. ProcessWORKS is compatible with different techniques for data acquisition and analysis, model adjustment and feedback, and model optimization. ProcessWORKS is also designed to deal with practical implementation issues in the fab. In this talk we will review the benefits of ProcessWORKS run-to-run control. We will discuss some practical problems in the deployment of run-to-run control in the fab, and we will show how ProcessWORKS deals with these issues. Examples from the deployment of ProcessWORKS at Texas Instruments on state of the art semiconductor technologies will be given.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jerry A. Stefani and Mike Anderson "Practical issues in the deployment of a run-to-run control system in a semiconductor manufacturing facility", Proc. SPIE 3742, Process and Equipment Control in Microelectronic Manufacturing, (23 April 1999); https://doi.org/10.1117/12.346250
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Process control

Process modeling

Semiconducting wafers

Control systems

Data modeling

Model-based design

Metrology

RELATED CONTENT


Back to Top