Defect detectability and printability of contact hole pattern of KrF halftone reticle

Kanji Takeuchi; Yutaka Miyahara

doi:10.1117/12.360251

25 August 1999 Defect detectability and printability of contact hole pattern of KrF halftone reticle

Kanji Takeuchi, Yutaka Miyahara

Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360251
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan

Abstract

It is difficult to use the normal way, in which whether a defect is tolerable or not is judged by measuring its size, to deal with KrF half-tone reticles, and the judgement is often vague. This is due to complicated shapes of defects and strict quality demands on KrF halftone reticles. To solve the problem, the Defect Area Ratio method, in which the ratio between the defect area and the normal area is used to assess the defect, is proposed and the corresponding investigations are made. As the result of our studies, the specifications on reticle defects deduced from CD variation budget on wafer have been presented. However, the specifications deduced are too tight to be met with current reticle inspection machines.

Citation Download Citation

Kanji Takeuchi and Yutaka Miyahara "Defect detectability and printability of contact hole pattern of KrF halftone reticle", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360251

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