Microfocusing between 1 and 5 keV with Wolter-type optics

Philippe Troussel; Pascal Munsch; Jean-Jacques Ferme

doi:10.1117/12.370112

16 November 1999 Microfocusing between 1 and 5 keV with Wolter-type optics

Philippe Troussel, Pascal Munsch, Jean-Jacques Ferme

Proceedings Volume 3773, X-Ray Optics Design, Performance, and Applications; (1999) https://doi.org/10.1117/12.370112
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

Advanced Wolter X-ray microscope is developed to diagnose laser-produced plasmas and for the researching Inertial Confinement Fusion (ICF). The microscope is composed of two aspherical mirrors. We present X-ray Imaging Diagnostic and imaging studies we have performed with two kinds of X-ray source: an x-ray generator and a plasma laser x-ray source obtained with a power laser facility at 'Centre d'etudes de Limeil-Valenton,' France. A spatial resolution of better than 4 micrometer has been obtained in the 1 - 5 keV range over a field of 500 micrometer and for different magnifications varying from 15 to 40.

Citation Download Citation

Philippe Troussel, Pascal Munsch, and Jean-Jacques Ferme "Microfocusing between 1 and 5 keV with Wolter-type optics", Proc. SPIE 3773, X-Ray Optics Design, Performance, and Applications, (16 November 1999); https://doi.org/10.1117/12.370112

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