Error analysis of a multiaxis nanometric optical metrology system for microdynamic experiments

Koroush Iranpour-Tehrani; Lee D. Peterson; Jason D. Hinkle

doi:10.1117/12.363819

28 September 1999 Error analysis of a multiaxis nanometric optical metrology system for microdynamic experiments

Koroush Iranpour-Tehrani, Lee D. Peterson, Jason D. Hinkle

Proceedings Volume 3786, Optomechanical Engineering and Vibration Control; (1999) https://doi.org/10.1117/12.363819
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

The objective of ground based microdynamic testing of deployable space structures is to determine and develop a better understanding of the submicron dynamics that exists between moving contact surfaces. Such measurements often use laser and video metric metrology systems. These measurement however, are corrupted by random environmental perturbations of the metrology optics. This paper represents a statistical method for obtaining the margin of perturbations on the optics. The optics used are those for one of the preliminary flight configurations for the Micron Accuracy Deployment Experiments Space Station laboratory. The approach and method used to determine the extent of the effect of the random environmental perturbations on the measurements is explained and results are obtained. The results indicate that for 100 nanometer total allowable error. The optics need to be stable to within 85 nm of displacement and 10 mArcSec of rotation.

Citation Download Citation

Koroush Iranpour-Tehrani, Lee D. Peterson, and Jason D. Hinkle "Error analysis of a multiaxis nanometric optical metrology system for microdynamic experiments", Proc. SPIE 3786, Optomechanical Engineering and Vibration Control, (28 September 1999); https://doi.org/10.1117/12.363819

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