Selected Characterization Techniques For Optical Thin Films And Surfaces

H. E. Bennett

doi:10.1117/12.934990

8 November 1983 Selected Characterization Techniques For Optical Thin Films And Surfaces

H. E. Bennett

Proceedings Volume 0387, Technology of Stratified Media; (1983) https://doi.org/10.1117/12.934990
Event: 1983 Los Angeles Technical Symposium, 1983, Los Angeles, United States

Abstract

Important parameters for evaluating and characterizing thin films include (1) film thickness and index of refraction, (2) volume absorption coefficient of the film material, (3) surface absorption, (4) impurities and structure of the deposited film, (5) surface irregularities and defects, (6) light scattering, (7) adherence, hardness, and resistance to chemical attack, and (8) thickness nonuniformity and the resulting apparent change in optical figure. These parameters and some of the many ways to measure them will be discussed. To avoid systematic errors, it is advisable to use two or more independent techniques whenever possible.

Citation Download Citation

H. E. Bennett "Selected Characterization Techniques For Optical Thin Films And Surfaces", Proc. SPIE 0387, Technology of Stratified Media, (8 November 1983); https://doi.org/10.1117/12.934990

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