Advanced mask technology for 230-mm reticle fabrication

Koji Hiruta; Shinji Kubo; Takayuki Iwamatsu; Tatsuya Fujisawa; Masao Sugiyama; Hiroaki Morimoto

doi:10.1117/12.373294

30 December 1999 Advanced mask technology for 230-mm reticle fabrication

Koji Hiruta, Shinji Kubo, Takayuki Iwamatsu, Tatsuya Fujisawa, Masao Sugiyama, Hiroaki Morimoto

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373294
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

This work demonstrated the ability of 230 mm reticle manufacture by a current technology. The CD accuracy of 17 nm (3 (sigma) ) and image placement accuracy of 30 nm (3 (sigma) ) were obtained in the 230 mm reticle. It was able to be confirmed that there was no big problem though the improvement was still necessary for manufacturing equipment of 230 mm reticle.

Citation Download Citation

Koji Hiruta, Shinji Kubo, Takayuki Iwamatsu, Tatsuya Fujisawa, Masao Sugiyama, and Hiroaki Morimoto "Advanced mask technology for 230-mm reticle fabrication", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373294

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