Puddle developers for ZEP 7000

Kakuei Ozawa; Nobunori Abe

doi:10.1117/12.373350

30 December 1999 Puddle developers for ZEP 7000

Kakuei Ozawa, Nobunori Abe

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373350
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

We have developed two puddle developers for ZEP7000. These developers are the mixtures of solvents having almost the same boiling points at higher temperature. Developer A and B are vaporized much slower than ZED500. Excellent CD uniformity is expected with them. Developers A and B are a stronger and a milder developers than ZED500, respectively. In this report, we focus on Developer B, taking the request of high resolution into consideration. We report the evaluation results of Developer B in comparison with ZED500.

Citation Download Citation

Kakuei Ozawa and Nobunori Abe "Puddle developers for ZEP 7000", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373350

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