Paper
3 September 1999 New dimensions of micromachining with 157-nm laser light
Michael Kauf, Heinrich Endert, John H. Fair, Rainer Paetzel, Michael J. Scaggs, Dirk Basting
Author Affiliations +
Proceedings Volume 3875, Materials and Device Characterization in Micromachining II; (1999) https://doi.org/10.1117/12.360464
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States
Abstract
Fluorine (F2) lasers emit at 157 nm, the shortest commercially available laser wavelength. Innovations such as NovaTubeTM technology have resulted in powerful, highly reliable and cost effective F2 lasers. This paper will discuss the most recent F2 laser developments, resulting in repetition rates up to 1000 Hz and pulse energies in excess of 25 mJ. The industry now considers F2 lasers to be the next step (after ArF at 193 nm) in key technologies such as lithography and micromachining.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael Kauf, Heinrich Endert, John H. Fair, Rainer Paetzel, Michael J. Scaggs, and Dirk Basting "New dimensions of micromachining with 157-nm laser light", Proc. SPIE 3875, Materials and Device Characterization in Micromachining II, (3 September 1999); https://doi.org/10.1117/12.360464
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KEYWORDS
Laser applications

Micromachining

Excimer lasers

Lithography

Optical lithography

Deep ultraviolet

Laser development

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