Modeling of a pulsed HF chemical laser pumped by a VUV radiation source

Marc P. Sabonnadiere; Vadim I. Tcheremiskine; Philippe Ch. Delaporte; L. D. Mikheev; Marc L. Sentis

doi:10.1117/12.380855

3 April 2000 Modeling of a pulsed HF chemical laser pumped by a VUV radiation source

Marc P. Sabonnadiere, Vadim I. Tcheremiskine, Philippe Ch. Delaporte, L. D. Mikheev, Marc L. Sentis

Proceedings Volume 3889, Advanced High-Power Lasers; (2000) https://doi.org/10.1117/12.380855
Event: Advanced High-Power Lasers and Applications, 1999, Osaka, Japan

Abstract

We introduce a numerical investigation of a HF photochemical laser pumped by planar multi-channel sliding discharge to study the possibility of advanced laser characteristic achievement using such pumping source. The model considers transport of VUV pump radiation through the nonlinear absorptive active medium containing NF₃/H₂/N₂Ar gas mixture coupled with chemical and lasing kinetics describing the temporal and spatial evolution of particle species and intracavity lasing photons. The relative importance of various kinetic processes is evaluated and the 3.2 J/liter laser specific energy is calculated.

Citation Download Citation

Marc P. Sabonnadiere, Vadim I. Tcheremiskine, Philippe Ch. Delaporte, L. D. Mikheev, and Marc L. Sentis "Modeling of a pulsed HF chemical laser pumped by a VUV radiation source", Proc. SPIE 3889, Advanced High-Power Lasers, (3 April 2000); https://doi.org/10.1117/12.380855

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