Diffusion mechanisms in microlithographic thin polymeric films

Dan V. Nicolau; Takahisa Taguchi; Susumu Yoshikawa

doi:10.1117/12.364491

1 October 1999 Diffusion mechanisms in microlithographic thin polymeric films

Dan V. Nicolau, Takahisa Taguchi, Susumu Yoshikawa

Proceedings Volume 3892, Device and Process Technologies for MEMS and Microelectronics; (1999) https://doi.org/10.1117/12.364491
Event: Asia Pacific Symposium on Microelectronics and MEMS, 1999, Gold Coast, Australia

Abstract

The contribution proposes relationships for the diffusivity of small molecular species in resist systems; then reviews the possible mechanisms in thin polymeric films, namely simple Fickian, Case II, and diffusion accompanied by chemical reaction, with relevance to microlithography processes. The review of the kinetics reveals the inconsistencies in the models advanced for two important microlithographic processes: (i) silylation in Surface Imaging patterning; and (ii) the deactivation of the Chemical Amplification resist due to the parasitic diffusion of N-methyl-pyrolid-one. These inconsistencies can be easily and elegantly resolved only if the polymeric thin film system is supposed to exhibit a kinetics consistent with the diffusion accompanied by chemical reaction.

Citation Download Citation

Dan V. Nicolau, Takahisa Taguchi, and Susumu Yoshikawa "Diffusion mechanisms in microlithographic thin polymeric films", Proc. SPIE 3892, Device and Process Technologies for MEMS and Microelectronics, (1 October 1999); https://doi.org/10.1117/12.364491

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