Laser ablation of solid films at a cryogenic temperature

Hiroyuki Niino; Tadatake Sato; Akira Yabe

doi:10.1117/12.387553

7 June 2000 Laser ablation of solid films at a cryogenic temperature

Hiroyuki Niino, Tadatake Sato, Akira Yabe

Proceedings Volume 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V; (2000) https://doi.org/10.1117/12.387553
Event: Symposium on High-Power Lasers and Applications, 2000, San Jose, CA, United States

Abstract

In order to create new possibilities of laser ablation technique, the laser ablation of nitrogen solid films deposited on a copper plate at 10 K was performed upon irradiation with a picosecond UV laser in vacuum. UV and visible emissions, which were ascribed to the transition form excited molecular and atomic nitrogen, were detected on the film during the laser irradiation at the fluence of 5 J/cm²/pulse. These excited species would be produced in a multi-photon absorption process of the nitrogen by the ps- laser irradiation. At the fluence of ca. 10 J/cm²/pulse, ablation of the film was observed. Plume of the ablation reacted with the surface of graphite. XPS analysis indicated that nitrides formed don the graphite surface by the exposure to the plume. A novel technique for surface modification of materials is made possible by the ps-laser ablation of nitrogen solid film.

Citation Download Citation

Hiroyuki Niino, Tadatake Sato, and Akira Yabe "Laser ablation of solid films at a cryogenic temperature", Proc. SPIE 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V, (7 June 2000); https://doi.org/10.1117/12.387553

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