Paper
29 March 2000 Anamorphic lenses for laser diode circularization
Jeremiah D. Brown, Daniel M. Brown, Gregg T. Borek
Author Affiliations +
Abstract
The design, fabrication, and testing of a new anamorphic microlens for laser diode circularization is presented. The microlens is fabricated using photolithography, gray scale masks, and reactive ion etching. A front-to-back mask aligner is used to precisely align two anamorphic aspheric microlenses on opposite sides of a single wafer, creating the ability to circularize or collimate a laser diode with only a single monolithic element. The entire fabrication process is highly nonlinear. This requires that accurate surface metrology methods be incorporated into the process as a feedback loop for iterative corrections to the gray scale mask. We discuss the measurement process and the effects of surface errors for circularizers and circularizer/collimators. This device has been under development for about two years at MEMS Optical. The most recent fabrication and test results of an actual device are presented.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jeremiah D. Brown, Daniel M. Brown, and Gregg T. Borek "Anamorphic lenses for laser diode circularization", Proc. SPIE 3945, Laser Diodes and LEDs in Industrial, Measurement, Imaging, and Sensors Applications II; Testing, Packaging, and Reliability of Semiconductor Lasers V, (29 March 2000); https://doi.org/10.1117/12.380523
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Cited by 1 scholarly publication and 3 patents.
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KEYWORDS
Semiconductor lasers

Photomasks

Diodes

Microlens

Tolerancing

Lens design

Lenses

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