CW CO[sub]2 [/sub]Laser Annealing

L. Nanu; E. Cojocaru; I. N. Mihailescu; L. C. Nistor; V. Teodorescu

doi:10.1117/12.935408

26 October 1983 CW CO₂Laser Annealing

L. Nanu, E. Cojocaru, I. N. Mihailescu, L. C. Nistor, V. Teodorescu

Proceedings Volume 0398, Industrial Applications of Laser Technology; (1983) https://doi.org/10.1117/12.935408
Event: 1983 International Technical Conference/Europe, 1983, Geneva, Switzerland

Abstract

The paper reports on a numerical analysis of the thermal phenomena during cw CO₂ laser annealing of implanted silicon. At the surface of the sample the nonlinear heat equation was solved together with diffusion equation for free-carriers density. The results are in a quite good agreement with the reported experimental results.

Citation Download Citation

L. Nanu, E. Cojocaru, I. N. Mihailescu, L. C. Nistor, and V. Teodorescu "CW CO₂Laser Annealing", Proc. SPIE 0398, Industrial Applications of Laser Technology, (26 October 1983); https://doi.org/10.1117/12.935408

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