Xenon liquid-jet laser plasma source for EUV lithography

Bjoern A. M. Hansson; Magnus Berglund; Oscar E. Hemberg; Hans M. Hertz

doi:10.1117/12.390049

21 July 2000 Xenon liquid-jet laser plasma source for EUV lithography

Bjoern A. M. Hansson, Magnus Berglund, Oscar E. Hemberg, Hans M. Hertz

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390049
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

We describe a laser-plasma source based on a cryogenic xenon liquid-jet target suitable for extreme ultraviolet (EUV) projection lithography. Recent improvements in the stability of the xenon jet allows efficient laser-plasma operation several millimeters away from the nozzle orifice. We present the first preliminary laser-to-EUV conversion efficiencies, although under non-optimized conditions, for the source.

Citation Download Citation

Bjoern A. M. Hansson, Magnus Berglund, Oscar E. Hemberg, and Hans M. Hertz "Xenon liquid-jet laser plasma source for EUV lithography", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390049

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