Development of 157-nm small-field and mid-field microsteppers

Ron E. Miller; Paul M. Bischoff; Roger C. Sumner; Stephen W. Bowler; Warren W. Flack; Galen Fong

doi:10.1117/12.388998

5 July 2000 Development of 157-nm small-field and mid-field microsteppers

Ron E. Miller, Paul M. Bischoff, Roger C. Sumner, Stephen W. Bowler, Warren W. Flack, Galen Fong

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388998
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The continuos advancement of optical lithography into the regime of sub-100nm patterning capability requires the utilization of shorter exposure wavelengths such as 157nm. This in turn requires modifications in lens performance and stepper body performance. Advances in index homogeneity have made it possible to develop 157nm lens systems suitable for investigating sub-100nm lithography. Recent advances in the transmission of modified fused silica as a reticle material have made it more desirable to pursue 157nm lithography tools. MicroSteppers are a necessary vehicle to obtain photoresist and process information pertaining to the efficacy of this technology for production at the 100nm and 70nm device nodes.

Citation Download Citation

Ron E. Miller, Paul M. Bischoff, Roger C. Sumner, Stephen W. Bowler, Warren W. Flack, and Galen Fong "Development of 157-nm small-field and mid-field microsteppers", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388998

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