Tungsten thin films deposition on tool steel substrates

Qixin Guo; Mitsuhiro Nishio; Hiroshi Ogawa

doi:10.1117/12.408473

29 November 2000 Tungsten thin films deposition on tool steel substrates

Qixin Guo, Mitsuhiro Nishio, Hiroshi Ogawa

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408473
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

Thin films of tungsten used as buffer layers for diamond coating on tool steels have been prepared by rf magnetron sputtering. The tungsten deposition rates as functions of argon pressure and rf input power are reported. The effects of argon pressure and rf input power on the film structures have also been studied. Finally, it has been demonstrated that continuous diamond films can be grown on tool steels by using tungsten films as buffer layers.

Citation Download Citation

Qixin Guo, Mitsuhiro Nishio, and Hiroshi Ogawa "Tungsten thin films deposition on tool steel substrates", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408473

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