New photoresists from carbazol-containing photopolymers

Valeriu V. Bivol; Stephan V. Robu; Galina Dragalina; L. Bostan; A. M. Prisacari; A. Coban

doi:10.1117/12.406305

15 December 2000 New photoresists from carbazol-containing photopolymers

Valeriu V. Bivol, Stephan V. Robu, Galina Dragalina, L. Bostan, A. M. Prisacari, A. Coban

Proceedings Volume 4087, Applications of Photonic Technology 4; (2000) https://doi.org/10.1117/12.406305
Event: 2000 International Conference on Application of Photonic Technology (ICAPT 2000), 2000, Quebec City, Canada

Abstract

With the purpose of expansion of polymer materials in the area of fotonics and image registration we prepared, tested and investigated photopolymer photoresist layers from carbazolylalcylmethacrylats (CEM) with oktylmethacrylats (OMA) copolymers, having the high photosensitivity, adhesive and film forming properties. The photopolymer layers were made by pouring from solutions. The contents of iodophorm and other electron-acceptor additives was maintained within the limits of 5-10 weight % ofthe photopolymer. For all the photoresist layers the photographic sensitivity, factor of contrast, diffraction efficiency and resolution at holographic recording were studied. The numerous tests of the samples have shown, that complete crosslinking of copolymer CEM:OMA layers occurs during 10 - 15 s at (4,0 - 5,0) sm2/mWxs. The photographic sensitivity depends on the thickness of photopolymer layer. To examine the holographic characteristics of the layers, the growth kinetics of diffraction efficiency in dependence on the doze of exposure, the kinetics of diffraction efficiency in dependence on the duration and conditions of solvent treatment were investigated, the holographic sensitivity, resolution capability and optimal diffraction efficiency of the photoresist layers have been defmed. The diffraction efficiency more than 20% and the resolution capability up to 2500 irmiT1 were obtained for the developed photoresist layers based on CEM:OMA photopolymers.

Citation Download Citation

Valeriu V. Bivol, Stephan V. Robu, Galina Dragalina, L. Bostan, A. M. Prisacari, and A. Coban "New photoresists from carbazol-containing photopolymers", Proc. SPIE 4087, Applications of Photonic Technology 4, (15 December 2000); https://doi.org/10.1117/12.406305

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