Integrated applications of inspection data in the semiconductor manufacturing environment

Kenneth W. Tobin Jr.; Thomas P. Karnowski; Fred Lakhani

doi:10.1117/12.429361

5 June 2001 Integrated applications of inspection data in the semiconductor manufacturing environment

Kenneth W. Tobin Jr., Thomas P. Karnowski, Fred Lakhani

Proceedings Volume 4275, Metrology-based Control for Micro-Manufacturing; (2001) https://doi.org/10.1117/12.429361
Event: Photonics West 2001 - LASE, 2001, San Jose, CA, United States

Abstract

As integrated circuit fabrication processes continue to increase in complexity, it has been determined that data collection, retention, and retrieval rates will continue to increase at an alarming rate. At future technology nodes, the time required to source manufacturing problems must at least remain constant to maintain anticipated productivity as suggested in the International Technology Roadmap for Semiconductors. Strategies and software methods for integrated yield management have been identified as critical for maintaining this productivity. Integrated yield management must use circuit design, visible defect, parametric, and functional test data to recognize process trends and excursions so that yield-detracting mechanisms can be rapidly identified and corrected. This will require the intelligent merging of the various data sources that are collected and maintained throughout the fabrication environment.

Citation Download Citation

Kenneth W. Tobin Jr., Thomas P. Karnowski, and Fred Lakhani "Integrated applications of inspection data in the semiconductor manufacturing environment", Proc. SPIE 4275, Metrology-based Control for Micro-Manufacturing, (5 June 2001); https://doi.org/10.1117/12.429361

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