Paper
16 August 2001 Massive replication of polymeric high-aspect-ratio microstructures using PDMS casting
Sangwon Park, Kabseog Kim, Harish M. Manohara, Jeong-Bong Lee
Author Affiliations +
Abstract
This paper presents a rapid replication technique for polydimethylsiloxane (PDMS) high aspect ratio microstructures (HARMs) and a pattern transfer technique for replication of metallic HARMs on other substrates (such as circuit containing substrates) using such replicated PDMS HARMs. A high aspect ratio metallic micromold insert, featuring a variety of test microstructures made of electroplated nickel, has been fabricated by the standard deep X-ray lithography (DXRL) process. Mixed pre-polymer PDMS with a curing agent has been cast onto the metallic micromold insert test patterns to create replicated polymeric HARMs. The replicated PDMS HARMs could be used to massively reproduce high aspect ratio metallic microstructures on other substrates using a pattern transfer technique. In order to demonstrate the concept, an experiment has been carried out to attach the replicated PDMS HARMs onto a silicon substrate which has pre-deposited photoresist and metallic seed layer. Electrodeposition has been carried out through the attached PDMS HARMs mold followed by the subsequent removal of the PDMS, resulting in high aspect ratio metallic microstructures on the silicon substrate. This technique could be used to massively reproduce metallic HARMs on circuit containing substrates to create 3-D integrated MEMS devices.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sangwon Park, Kabseog Kim, Harish M. Manohara, and Jeong-Bong Lee "Massive replication of polymeric high-aspect-ratio microstructures using PDMS casting", Proc. SPIE 4334, Smart Structures and Materials 2001: Smart Electronics and MEMS, (16 August 2001); https://doi.org/10.1117/12.436611
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CITATIONS
Cited by 4 scholarly publications and 1 patent.
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KEYWORDS
Silicon

Nickel

Polymers

Microelectromechanical systems

Scanning electron microscopy

Photomicroscopy

Photoresist materials

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