Effect of fluorinated monomer unit introduction to KrF resin system in F2 lithography

Yasunori Uetani; Kazuhiko Hashimoto; Yoshiko Miya; Isao Yoshida; Mikio Takigawa; Ryotaro Hanawa

doi:10.1117/12.436869

24 August 2001 Effect of fluorinated monomer unit introduction to KrF resin system in F2 lithography

Yasunori Uetani, Kazuhiko Hashimoto, Yoshiko Miya, Isao Yoshida, Mikio Takigawa, Ryotaro Hanawa

Proceedings Volume 4345, Advances in Resist Technology and Processing XVIII; (2001) https://doi.org/10.1117/12.436869
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

We reported the novel copolymer system containing fluorine atom with hydroxystyrene (HST) and 3-(perfluoro-3- methylbutyl)-2-hydroxypropyl methacrylate (MBHPMA). Using the copolymer, melamine crosslinker and PAG, negative resist was formulated. Transmittance of the resist film was 35% at 0.1micrometers thickness. High contrast negative pattern was obtained by F₂ excimer laser exposure. Dry-etching resistance of the resist was comparative to novolak type i- line resist.

Citation Download Citation

Yasunori Uetani, Kazuhiko Hashimoto, Yoshiko Miya, Isao Yoshida, Mikio Takigawa, and Ryotaro Hanawa "Effect of fluorinated monomer unit introduction to KrF resin system in F2 lithography", Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); https://doi.org/10.1117/12.436869

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