New projection lens system for KrF exposure scanning tool

Tomoyuki Matsuyama; Junichi Misawa; Yuichi Shibazaki

doi:10.1117/12.435753

14 September 2001 New projection lens system for KrF exposure scanning tool

Tomoyuki Matsuyama, Junichi Misawa, Yuichi Shibazaki

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435753
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

In this paper we review our newly developed high NA projection lens for KrF scanner (NSR-S205C.) The projection lens has 0.75 NA and small residual aberration. In a designing step, aspherical surfaces are utilized to decrease lens dimensions without degradation of the lens performance. Actual lens performance, which includes wavefront aberration, distortion, image plane flatness and resist profiles, is reviewed.

Citation Download Citation

Tomoyuki Matsuyama, Junichi Misawa, and Yuichi Shibazaki "New projection lens system for KrF exposure scanning tool", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435753

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