Present status of development of gas-purging and chemically clean technologies at ASET

Yasuaki Fukuda; Seiji Takeuchi; Takashi Aoki; Soichi Owa; Fumika Yoshida; Youichi Kawasa; Akira Sumitani; Keiji Egawa; Takehito Watanabe; Kiyoharu Nakao

doi:10.1117/12.435763

14 September 2001 Present status of development of gas-purging and chemically clean technologies at ASET

Yasuaki Fukuda, Seiji Takeuchi, Takashi Aoki, Soichi Owa, Fumika Yoshida, Youichi Kawasa, Akira Sumitani, Keiji Egawa, Takehito Watanabe, Kiyoharu Nakao

Author Affiliations +

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435763
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Purging and contamination are two important issues that need to be treated in order to realize F₂ laser lithography system. For the purpose of developing gas-purging and chemically clean technologies, we designed and constructed an experimental set-up. It is used for the study of purging and out-gassing evaluation in order to obtain useful data for development of exposure system. Preliminary experiments showed that purging condition has a strong effect on the residual oxygen and water concentration in the final gas-replaced atmosphere. And we have found that the amount of out-gas depends on the surface finish method of the material used through analyses of impurity gas examination with or without laser irradiation.

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Yasuaki Fukuda, Seiji Takeuchi, Takashi Aoki, Soichi Owa, Fumika Yoshida, Youichi Kawasa, Akira Sumitani, Keiji Egawa, Takehito Watanabe, and Kiyoharu Nakao "Present status of development of gas-purging and chemically clean technologies at ASET", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435763

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