Statistical method for influence of exposure and focus error on CD variation

Shoji Mimotogi

doi:10.1117/12.435730

14 September 2001 Statistical method for influence of exposure and focus error on CD variation

Shoji Mimotogi

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435730
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Lithographic process fluctuations are treated as statistical values and reduced to effective exposure and focus error. The distribution function of CD is derived in the analytical formula in order to calculate CD yield which is important to device characteristics. The process fluctuations are represented as a summation of mean value for interval of process control and deviation from the mean value. New process window for the mean values is proposed using the CD yield. The process window expands when the frequency of process control increases. Quantitative evaluation is performed under the allowable CD yield.

Citation Download Citation

Shoji Mimotogi "Statistical method for influence of exposure and focus error on CD variation", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435730

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