Paper
12 April 2001 Laser-induced damage of fluoride coatings for UV lasers
K. Yoshida, M. Ohya, K. Yagi, Toshimasa Matsuoka, Kanyoshi Ochi, M. Sunagawa, Tomosumi Kamimura
Author Affiliations +
Abstract
UV and DUV lasers are very important for many applications such as micro-machining, new material creation, medical care, and photo-lithography. Laser-induced damage of thin films coated on optical components used for UV and DUV lasers are serious problem. We have developed a new technique for producing anti- reflection (AR) coating on various substrate materials including fused silica glass and CaF2 crystal. In this technique, porous magnesium fluoride (MgF2) AR coating was developed. The reflectance of the porous AR coating on fused silica substrate was 0.3% at 500 nm.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. Yoshida, M. Ohya, K. Yagi, Toshimasa Matsuoka, Kanyoshi Ochi, M. Sunagawa, and Tomosumi Kamimura "Laser-induced damage of fluoride coatings for UV lasers", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425066
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KEYWORDS
Ultraviolet radiation

Laser induced damage

Antireflective coatings

Deep ultraviolet

Laser applications

Silica

Magnesium fluoride

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