New mask data verification method after optical proximity effect correction

Kazuhisa Ogawa; Isao Ashida; Hiroichi Kawahira

doi:10.1117/12.438340

5 September 2001 New mask data verification method after optical proximity effect correction

Kazuhisa Ogawa, Isao Ashida, Hiroichi Kawahira

Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438340
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan

Abstract

We propose a practical method of verifying mask data after optical proximity effect correction (OPC). The procedure is as follows. 1) Perform OPC using two tools that have different algorithms. 2) compare these OPC data dn if any differences are found, proceed to the next step. 3) Screening regions are defined by the original (pre-OPC) layout and the differences in these regions are filtered. Total CPU time for this verification is about 5 hours for a chip with 4 million gates.

Citation Download Citation

Kazuhisa Ogawa, Isao Ashida, and Hiroichi Kawahira "New mask data verification method after optical proximity effect correction", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438340

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