Storage Ring Design For X-Ray Lithography

A van Steenbergen; W Grobman

doi:10.1117/12.939209

19 March 1984 Storage Ring Design For X-Ray Lithography

A van Steenbergen, W Grobman

Proceedings Volume 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology; (1984) https://doi.org/10.1117/12.939209
Event: 27th Annual Technical Symposium, 1983, San Diego, United States

Abstract

The design of an electron storage ring for Industrial X-ray Lithography is examined and a parameter optimization carried out based on a model lithography system in use at the National Synchrotron Light Source at Brookhaven National Laboratory. In this optimization the potential use of superconducting or permanent magnet wigglers is considered. The basic parameters and geometry of a number of "t(exposure) = 5 sec., X (operating) = 8.26 A" devices are presented.

Citation Download Citation

A van Steenbergen and W Grobman "Storage Ring Design For X-Ray Lithography", Proc. SPIE 0448, X-Ray Lithography and Applications of Soft X-Rays to Technology, (19 March 1984); https://doi.org/10.1117/12.939209

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