Repair and imaging of 193-nm MoSiON phase-shift photomasks

Chris Marotta; Joshua Lessing; Jeff Marshman; Marcus Ramstein

doi:10.1117/12.458283

11 March 2002 Repair and imaging of 193-nm MoSiON phase-shift photomasks

Chris Marotta, Joshua Lessing, Jeff Marshman, Marcus Ramstein

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458283
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

In this paper, we will be discussing the repair of 193 nm Molybdenum Silicide (MoSiON) phase-shift masks by Focused Ion Beam (FIB) technology. Development of a next generation FIB column has allowed greater resolution of photomask patterns enabling efficient repair of 193 nm MoSiON phase-shift mask defects in patterns as small as 480 nm on the mask. The capabilities of this next generation VisIONT ion beam column achieve enhanced imaging at lower ion beam currents, minimizing damage to the substrate material while improving repair profiles. Both clear defects and opaque defects were investigated.

Citation Download Citation

Chris Marotta, Joshua Lessing, Jeff Marshman, and Marcus Ramstein "Repair and imaging of 193-nm MoSiON phase-shift photomasks", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458283

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