Paper
31 May 1984 Oxidation Of Singular And Vicinal Surfaces Of Silicon: The Structure Of Si-Si02 Interface
J. H. Mazur, R. Gronsky, J. Washburn
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Abstract
The structure of interfaces between silicon oxides grown in dry oxygen on singular and vicinal (111) surfaces of silicon has been studied using cross-sectional high resolution transmission electron microscopy. Crystalline silicon was found to terminate abruptly on (111) planes, where it transforms to amorphous Si02. One interplanar distance high ledges, separated by (111) terraces were found to be present on all surfaces studied. The width of the terraces was surface orientation dependent. It is suggested that such a structure of the interface can be explained by a terrace-ledge-kink model and that high temperature oxidation proceeds by a ledge mechanism similar to that for evaporation from the surface.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. H. Mazur, R. Gronsky, and J. Washburn "Oxidation Of Singular And Vicinal Surfaces Of Silicon: The Structure Of Si-Si02 Interface", Proc. SPIE 0463, Advanced Semiconductor Processing/Characterization of Electronic/Optical Materials, (31 May 1984); https://doi.org/10.1117/12.941353
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Cited by 3 scholarly publications.
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KEYWORDS
Silicon

Interfaces

Oxidation

Oxides

Semiconducting wafers

Transmission electron microscopy

Crystals

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