Paper
22 May 2002 Gain and carrier-induced refractive index change in group-III nitride quantum wells
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Abstract
This paper analyses the gain and carrier-induced refractive index change in group-III nitride quantum wells. An approach based on the semiconductor Bloch equations with carrier-carrier collisions treated at the level of quantum kinetic theory is used. The influences of the strong carrier-carrier Coulomb interaction and the quantum-confined Stark effect on laser threshold and output beam quality are discussed.
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Weng W. Chow and Hans Christian Schneider "Gain and carrier-induced refractive index change in group-III nitride quantum wells", Proc. SPIE 4651, Novel In-Plane Semiconductor Lasers, (22 May 2002); https://doi.org/10.1117/12.467943
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KEYWORDS
Quantum wells

Refractive index

Laser damage threshold

Gallium

Semiconductor lasers

Indium

Indium gallium nitride

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