Development of a dual-probe Caliper CD-AFM for near model-independent nanometrology

Vladimir Mancevski; Paul F. McClure

doi:10.1117/12.473418

16 July 2002 Development of a dual-probe Caliper CD-AFM for near model-independent nanometrology

Vladimir Mancevski, Paul F. McClure

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473418
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

A Caliper CD-AFM under development at Xidex uses dual atomic force microscope (AFM) probes that operate together as a caliper for accessing vertical and highly reentrant sidewalls of high aspect-ratio features. This virtually eliminates the ubiquitous effect of probe width, which has been a large component of uncertainty in optical, scanning electron microscope (SEM), and scanning probe microscopy (SPM) linewidth measurements for decades. The resulting tool architecture eliminates the main model-dependent uncertainties associated with nanometer-scale length measurements. By drastically reducing the magnitude, complexity, and variability of model dependence, the tool is made more robust and easier to calibrate. We have already demonstrated the functionality of a single tilted probe. Future developments include dual tilted probes that scan in coordinated fashion.

Citation Download Citation

Vladimir Mancevski and Paul F. McClure "Development of a dual-probe Caliper CD-AFM for near model-independent nanometrology", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473418

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