Exploring the resolution limits of phase-shift mask lithography with a very high numerical aperture ArF step-and-scan system

Harry Sewell; Pankaj Raval; Diane C. McCafferty

doi:10.1117/12.473481

16 July 2002 Exploring the resolution limits of phase-shift mask lithography with a very high numerical aperture ArF step-and-scan system

Harry Sewell, Pankaj Raval, Diane C. McCafferty

Author Affiliations +

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473481
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

This paper studies the resolution limits of optical lithography using phase-shift mask technology. Alternating phase-shift masks are studied in the context of the 70nm lithographic node. The performance of alternating phase-shift masks is measured at the limits of its resolution. Printing issues that result from phase errors on the reticle are observed. These phase errors result in a loss of depth of focus and ultimate resolution. A lithography-system-based solution to the mask phase errors is proposed. A small obscuration aperture that matches the partial coherence of the illumination is placed in the pupil plane of optics to block the zero-order light leakage that results from the phase error. This paper reports the performance and effects of using this obscuration aperture.

Citation Download Citation

Harry Sewell, Pankaj Raval, and Diane C. McCafferty "Exploring the resolution limits of phase-shift mask lithography with a very high numerical aperture ArF step-and-scan system", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473481

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