Simulation of imaging in projection microscope using multi-beam probe

Yeong-Uk Ko; David C. Joy

doi:10.1117/12.473497

16 July 2002 Simulation of imaging in projection microscope using multibeam probe

Yeong-Uk Ko, David C. Joy

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473497
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

We show simulation images of projection microscope, which uses parallel beam to the sample, detecting secondary electrons, photoelectrons and mirror electrons using electrons and UV/X-ray sources as probe beam. The results show we can see image for square and dense line patterns without charging and damage in the objects. This research can be used for quantitative analysis for projection microscope using multi beam source to get comprehensive information of many characteristics of objects as well as topographic information.

Citation Download Citation

Yeong-Uk Ko and David C. Joy "Simulation of imaging in projection microscope using multibeam probe", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473497

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