Optical Measurement Uncertainties And, Process Tolerances

Peter Grant; Tim Fahey

doi:10.1117/12.943044

15 October 1984 Optical Measurement Uncertainties And, Process Tolerances

Peter Grant, Tim Fahey

Proceedings Volume 0480, Integrated Circuit Metrology II; (1984) https://doi.org/10.1117/12.943044
Event: 1984 Technical Symposium East, 1984, Arlington, United States

Abstract

When measurements are made during the production of integrated circuit wafers on wafers that are out of specification, the wafers are considered misprocessed. Measurement accu-racy must be better than the specification to assure that the measurements are not part of the misprocessing problem. Optical tools have been used in the past for these critical dimension (CD) measurements. These tools have evolved from optical filars to TV pattern recognition to stepping a PMT aperture. This has improved the repeatability of measuring a single site multiple times by many operators to ±0.04 pm, 3.0 σ or better. However, with CDs of 1.0 μm or less, optical tools are reaching their limits of usability.

Citation Download Citation

Peter Grant and Tim Fahey "Optical Measurement Uncertainties And, Process Tolerances", Proc. SPIE 0480, Integrated Circuit Metrology II, (15 October 1984); https://doi.org/10.1117/12.943044

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