Energy flux method for die-to-database inspection of critical layer reticles

Hector I. Garcia; William Waters Volk; Yalin Xiong; Sterling G. Watson; Zongchang Yu; Zhian Guo; Lantian Wang

doi:10.1117/12.468207

27 December 2002 Energy Flux Method for Die-to-Database Inspection of Critical Layer Reticles

Hector I. Garcia, William Waters Volk, Yalin Xiong, Sterling G. Watson, Zongchang Yu, Zhian Guo, Lantian Wang

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.468207
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

With growing implementation of low k1 lithography on DUV scanners for wafer production, detecting and analyzing photomask critical dimension (CD) errors and semitransparent defects is vital for qualifying photomasks to enable high IC wafer yields for 130nm and 100nm nodes. Using the TeraStar pattern inspection system's image computer platform, a new die-to-database algorithm, TeraFlux, has been implemented and tested for the inspection of small "closed" features. The algorithm is run in die-to-database mode comparing the energy flux difference between reticle and the database reference for small closed features, such as, contacts, trenches, and cells on chrome and half-tone reticles. The algorithm is applicable to both clear and dark field reticles. Tests show the new algorithm provides CD error detection to 6% energy flux variation with low false defect counts. We have characterized the sensitivity and false defect performance of the die-to-database energy flux algorithm with production masks and programmed defect test masks. A sampling of inspection results will be presented. Wafer printability results using the programmed defects on a programmed defect test reticle will be presented and compared to the inspection defect sensitivity results.

Citation Download Citation

Hector I. Garcia, William Waters Volk, Yalin Xiong, Sterling G. Watson, Zongchang Yu, Zhian Guo, and Lantian Wang "Energy Flux Method for Die-to-Database Inspection of Critical Layer Reticles", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.468207

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available