Paper
27 December 2002 Filtering Noisy Data for T-less Model Calibration
Junjiang Lei, David K. H. Lay
Author Affiliations +
Abstract
The shape of a printed feature on a wafer is generally different from the corresponding pattern on the layout. T-less model is an effective method of predicting the contour line of a printed feature on a wafer. A calibration model is first established by using data from certain test patterns, and then applied to real layout to predict contour lines of features on a wafer. It would be computationally inaccessible to compute every point of a contour line. We only compute a number of points on a contour line and then extend these points to a curve by interpolation. Error occurs from many sources in this computation process and may give inaccurate interpolation. In this paper we present a computation scheme that filters noises from the calibrated data. This scheme is of two folds, removing outliers and interpolation. Our simulation results match the real data well. Inspired by natural cubic splines and nu- splines, we developed a new technique of spline interpolation, which has both the simplicity of the usual natural cubic spline interpolation and the flexibility of nu-splines.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junjiang Lei and David K. H. Lay "Filtering Noisy Data for T-less Model Calibration", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.467853
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KEYWORDS
Semiconducting wafers

Data modeling

Calibration

Photomasks

Wafer-level optics

Cadmium

Process modeling

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