Fabricated technology for polymer/Si arrayed waveguide grating

Yu Zhao; Fei Wang; Daming Zhang; Chunsheng Ma; Kaixin Chen; Shiyong Liu; Maobin Yi

doi:10.1117/12.480994

29 August 2002 Fabricated technology for polymer/Si arrayed waveguide grating

Yu Zhao, Fei Wang, Daming Zhang, Chunsheng Ma, Kaixin Chen, Shiyong Liu, Maobin Yi

Proceedings Volume 4905, Materials and Devices for Optical and Wireless Communications; (2002) https://doi.org/10.1117/12.480994
Event: Asia-Pacific Optical and Wireless Communications 2002, 2002, Shanghai, China

Abstract

In this paper, the basic principle, details of fabricating process and measuring results were described for a polymer/Si arrayed waveguide grating (AWG) multiplexer around the central wavelength of 1.550 micron with the wavelength spacing of 1.6nm. The fluorinated polymer was used to fabricate AWG to reduce the optical loss, but the fluorinated material was expensive, so we initially adopted the polymer of polymethylmethacrylate(PMMA) type to go on technologic research. The regulated curve of refractive index was given for the core polymer. In order to obtain better shape of the waveguide after the reactive ion etching (RIE) using oxygen, an aluminum film as mask was used on polymer instead of conventional photoresist as mask. In order to reduce radiation loss of underciadding layer to Si substrate, the underciadding layer thickness was increased to 11 micron through two times of spin-coating, thus the radiation loss was reduced to the order of 0.001dB. The measuring results indicates fabricated optical waveguide achieved single-mode transmission.

Citation Download Citation

Yu Zhao, Fei Wang, Daming Zhang, Chunsheng Ma, Kaixin Chen, Shiyong Liu, and Maobin Yi "Fabricated technology for polymer/Si arrayed waveguide grating", Proc. SPIE 4905, Materials and Devices for Optical and Wireless Communications, (29 August 2002); https://doi.org/10.1117/12.480994

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