EPL stencil mask defect inspection system using a transmission electron beam

Jiro Yamamoto; Teruo Iwasaki; Masaki Yamabe; Norimichi Anazawa; Satoru Maruyama; Kiyoaki Tsuta

doi:10.1117/12.484975

16 June 2003 EPL stencil mask defect inspection system using transmission electron beam

Jiro Yamamoto, Teruo Iwasaki, Masaki Yamabe, Norimichi Anazawa, Satoru Maruyama, Kiyoaki Tsuta

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.484975
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

A new mask inspection system using transmission electron beam (EB) technology is being developed to detect defects on electron projection lithography (EPL) masks with design rules of 65-nm and below. In our new system, we use the transmission EB image, multi-line Time Delayed Integration (TDI)-CCD camera, and stage scanning. The transmission EB image can detect defects hidden in stencil patterns with a very high resolution. The scanning system, combined with a high-speed image acquisition system, enables high throughput. A mganified image of the mask stencil pattern is formed on an image sensor by the electron-optic systme. The image of the stencil patterns is captured by a multi-line TDI-CCD camera and the image data is transferred to an image-processing unit composed of multi high-speed image processors. To capture an EB image, a special TDI-CCD camera was developed. The typical pixel size is 50-nm on the mask. To achieve the goal of high-speed image processing, multi-fiber cable is used to transfer the image data from the camera to the image-processor. Each image processor shares the inspection area in parallel, and performs a die-to-database comparison. Typical inspection time for a 200-nm EPL stencil mask is 4 to 5 hours. A defect of 50-nm was observed by the developing system. This inspection system will be completed in March 2004.

Citation Download Citation

Jiro Yamamoto, Teruo Iwasaki, Masaki Yamabe, Norimichi Anazawa, Satoru Maruyama, and Kiyoaki Tsuta "EPL stencil mask defect inspection system using transmission electron beam", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484975

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