Protecting reticles from contamination using SMIF technologies

Sheng-Bai Zhu

doi:10.1117/12.482642

2 June 2003 Protecting reticles from contamination using SMIF technologies

Sheng-Bai Zhu

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.482642
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

This paper discusses potential sources of contaminants, their impacts on lithography processes, and the possibility of solving such problems using SMIF technologies. Theoretical models are developed and experimental data are presented.

Citation Download Citation

Sheng-Bai Zhu "Protecting reticles from contamination using SMIF technologies", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.482642

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