193-nm detector nonlinearity measurement system at NIST

Shao Yang; Darryl A. Keenan; Holger Laabs; Marla L. Dowell

doi:10.1117/12.485343

26 June 2003 193-nm detector nonlinearity measurement system at NIST

Shao Yang, Darryl A. Keenan, Holger Laabs, Marla L. Dowell

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485343
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

To meet the semiconductor industry’s demands for accurate measurements on excimer lasers, we have developed a system using the correlation method to measure the nonlinear response of pulse energy detectors of excimer laser at 193 nm. The response of the detector under test to incident laser pulse energy is compared to the corresponding response of a linear monitor detector. This method solves the difficulties caused by large pulse-to-pulse instability of the excimer laser and delivers measurement results with an expanded uncertainty (k=2) of 0.8 %.

Citation Download Citation

Shao Yang, Darryl A. Keenan, Holger Laabs, and Marla L. Dowell "193-nm detector nonlinearity measurement system at NIST", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485343

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