A simple method to fabricate buried channel optical waveguides based on porous silicon

Zhenhong Jia; Chuzhe Tu; Jun Zhou; Rui Li

doi:10.1117/12.498856

24 April 2003 A simple method to fabricate buried channel optical waveguides based on porous silicon

Zhenhong Jia, Chuzhe Tu, Jun Zhou, Rui Li

Proceedings Volume 5116, Smart Sensors, Actuators, and MEMS; (2003) https://doi.org/10.1117/12.498856
Event: Microtechnologies for the New Millennium 2003, 2003, Maspalomas, Gran Canaria, Canary Islands, Spain

Abstract

The oxidised porous silicon buried channel waveguides were fabricated by selectively anodized with a PMMA film mask and controlling the electric current density intensities and anodisation time during anodisation process is reported in this paper. The propagaion loss of this oxidised porous silicon buried channel waveguides was measured to be 9.2dB/cm.

Citation Download Citation

Zhenhong Jia, Chuzhe Tu, Jun Zhou, and Rui Li "A simple method to fabricate buried channel optical waveguides based on porous silicon", Proc. SPIE 5116, Smart Sensors, Actuators, and MEMS, (24 April 2003); https://doi.org/10.1117/12.498856

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