Paper
10 November 2003 Vacuum ultraviolet Ar2* excimer excited by an ultrashort pulse high-intensity laser
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Proceedings Volume 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; (2003) https://doi.org/10.1117/12.515511
Event: XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2002, Wroclow, Poland
Abstract
We have observed Ar2* emission at 126 nm by use of a high intensity laser pulse as an excitation source. Kinetic analysis revealed that high-intensity laser-produced electrons via optical field induced ionization (OFI) process initiated the Ar2* production kinetics. Ar2* production kinetics initiated by OFI electrons was mainly governed by the three-body association process, which was analogous to the case of electron beam excitation. The use of a hollow fiber controlled propagation characteristics of a high intensity laser pulse in a high-pressure gas, leading to the increase of the excimer emission intensity
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masanori Kaku, Takeshi Higashiguchi, Shoichi Kubodera, and Wataru Sasaki "Vacuum ultraviolet Ar2* excimer excited by an ultrashort pulse high-intensity laser", Proc. SPIE 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (10 November 2003); https://doi.org/10.1117/12.515511
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KEYWORDS
Argon

Plasma

Electrons

Excimers

Electron beams

Excimer lasers

Vacuum ultraviolet

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