Implementation of 248-nm-based CD metrology for advanced reticle production

Andrew C. Hourd; Anthony Grimshaw; Gerd Scheuring; Christian Gittinger; Stefan Dobereiner; Frank Hillmann; Hans-Jurgen Bruck; Hans Hartmann; Volodymyr Ordynskyy; Kai Peter; Shiuh-Bin Chen; Parkson W. Chen; Rik M. Jonckheere; Vicky Philipsen; Thomas Schatz; Karl Sommer

doi:10.1117/12.515114

28 May 2003 Implementation of 248-nm based CD metrology for advanced reticle production

Andrew C. Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Stefan Dobereiner, Frank Hillmann, Hans-Jurgen Bruck, Hans Hartmann, Volodymyr Ordynskyy, Kai Peter, Shiuh-Bin Chen, Parkson W. Chen, Rik M. Jonckheere, Vicky Philipsen, Thomas Schatz, Karl Sommer

Author Affiliations +

Proceedings Volume 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2003) https://doi.org/10.1117/12.515114
Event: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2003, Sonthofen, Germany

Abstract

The MueTec advanced CD metrology and review station, operating at the DUV (248nm) wavelength, has been extensively characterised for a number of feature types relevant to advanced (9Onm technology node) reticles. Performance for resolution capability and measurement repeatability is presented here for chrome-on-glass feature types concentrating upon lines and spaces, contact holes and dots. The system has already demonstrated the ability to image 100nm Cr lines and sub-nanometre (3- sigma) long-term repeatability on lines and spaces down to 200nm in size. We will now show that this performance level can be achieved and sustained at production levels of throughput and under typical cleanroom environmental conditions. Performance of new software tools to support the advanced metrology of 90-nm node reticles will also be introduced and their performance evaluated. Comparison will be made between CD-SEM measurements and the advanced optical metrology offered by the tool. Finally, reliability data for the tool —both in terms of mechanical and sustained repeatability performance — will be given, following prolonged trials in a production environment.

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Andrew C. Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Stefan Dobereiner, Frank Hillmann, Hans-Jurgen Bruck, Hans Hartmann, Volodymyr Ordynskyy, Kai Peter, Shiuh-Bin Chen, Parkson W. Chen, Rik M. Jonckheere, Vicky Philipsen, Thomas Schatz, and Karl Sommer "Implementation of 248-nm based CD metrology for advanced reticle production", Proc. SPIE 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (28 May 2003); https://doi.org/10.1117/12.515114

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