Paper
22 December 2003 Ion beam milling of optically polished CaF2 surfaces
Author Affiliations +
Abstract
Calcium Fluoride roughness evolution caused by ion beam milling has been studied in dependence on the ion milling parameters and different optically polished surfaces, respectively. For polished surfaces with high crystal damage, the roughness is dominated by the uncovering of the sub-surface damage due to the ion beam milling. For smooth surfaces with low damage the roughness is an intrinsic one and the creation of self-organized nanoscale structures can be obtained. Ion milling parameters influence more the intrinsic roughness than the extrinsic. Generally, high ion energies and sputter gases with low atom mass produce rough surfaces. Low ion energies and gases with high mass result in smooth surfaces. Ion bombardment induces a decomposition of CaF2 in the near surface layer. Surface analytical measurements show that ion sputtering to some extent decompose the CaF2 surface layer in contrast to the combined action of ion sputtering and low energy electron irradiation. The measured higher VUV absorption after ion milling is caused by the modified sub-surface layer mainly and not by the increased surface roughness.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dieter Flamm, Axel Schindler, and Marion Berger "Ion beam milling of optically polished CaF2 surfaces", Proc. SPIE 5180, Optical Manufacturing and Testing V, (22 December 2003); https://doi.org/10.1117/12.505658
Lens.org Logo
CITATIONS
Cited by 6 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Ions

Surface finishing

Calcium

Polishing

Ion beams

Sputter deposition

Gases

RELATED CONTENT

Optical Glass Finishing
Proceedings of SPIE (December 21 1989)
Ultra-precision surface polishing using ion beam figuring
Proceedings of SPIE (October 16 2012)
An Ion Figuring System For Large Optic Fabrication
Proceedings of SPIE (December 22 1989)

Back to Top