Fabricating arrays of vanadium dioxide nanodisks by focused ion-beam lithography and pulsed-laser deposition

Richard F. Haglund Jr.; Rene Lopez; J. Y. Suh; Leonard C. Feldman; Tony E. Haynes; Lynn A. Boatner

doi:10.1117/12.532331

15 July 2004 Fabricating arrays of vanadium dioxide nanodisks by focused ion-beam lithography and pulsed-laser deposition

Richard F. Haglund Jr., Rene Lopez, J. Y. Suh, Leonard C. Feldman, Tony E. Haynes, Lynn A. Boatner

Author Affiliations +

Proceedings Volume 5339, Photon Processing in Microelectronics and Photonics III; (2004) https://doi.org/10.1117/12.532331
Event: Lasers and Applications in Science and Engineering, 2004, San Jose, Ca, United States

Abstract

Vanadium dioxide undergoes a structural (monoclinic to tetragonal) insulator-to-metal transition at 70°C, accompanied by large changes in electrical and optical properties. By combining focused ion-beam lithography and pulsed laser depo-sition, patterned arrays of vanadium dioxide nanoparticles are created that can be used for studies of linear and nonlinear optical physics, as well as demonstrating the potential for a variety of applications.

Citation Download Citation

Richard F. Haglund Jr., Rene Lopez, J. Y. Suh, Leonard C. Feldman, Tony E. Haynes, and Lynn A. Boatner "Fabricating arrays of vanadium dioxide nanodisks by focused ion-beam lithography and pulsed-laser deposition", Proc. SPIE 5339, Photon Processing in Microelectronics and Photonics III, (15 July 2004); https://doi.org/10.1117/12.532331

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