Bright Discharge Plasma Sources For X-Ray Lithography

Jay S. Pearlman; John C. Riordan

doi:10.1117/12.947490

20 June 1985 Bright Discharge Plasma Sources For X-Ray Lithography

Jay S. Pearlman, John C. Riordan

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947490
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

There are substantial advantages to bright plasma sources for submicron X-ray lithography. For example, throughputs of 40 wafer levels per hour can be maintained using existing, high resolution, single level resists. The high X-ray brightness of the discharge plasma source is achieved by operating at much higher energy density than conventional sources. The X-rays are emitted from a high temperature plasma, which is magnetically confined and dissipates its energy isotropically. Over the last two years, a significant effort at Maxwell Laboratories has been carried out to characterize the Z-pinch plasma source for applications such as lithography and microscopy. The technology has been brought to the point where high reliability, commercially available sources have been developed for X-ray microscopy. The state-of-the-art is discussed and projections are provided on the capabilities of high power bright discharge sources for lithographic applications.

Citation Download Citation

Jay S. Pearlman and John C. Riordan "Bright Discharge Plasma Sources For X-Ray Lithography", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947490

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