High-resolution EUV microstepper tool for resist testing and technology evaluation

Adam Brunton; Julian Cashmore; Peter Elbourn; Graeme Elliner; Malcolm C. Gower; Philipp Grunewald; M. Harman; S. Hough; N. McEntee; S. Mundair; D. Rees; P. Richards; V. Truffert; Ian Wallhead; Mike Whitfield

doi:10.1117/12.548343

20 May 2004 High-resolution EUV microstepper tool for resist testing and technology evaluation

Adam Brunton, Julian Cashmore, Peter Elbourn, Graeme Elliner, Malcolm C. Gower, Philipp Grunewald, M. Harman, S. Hough, N. McEntee, S. Mundair, D. Rees, P. Richards, V. Truffert, Ian Wallhead, Mike Whitfield

Author Affiliations +

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.548343
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Key features are presented of the Exitech MS-13 EUV Microstepper tool developed for EUV resist testing & technology evaluation at the 32nm node and beyond. Details of the tool design architecture, module layout, vacuum chamber, major subsystems including source, optics and performance specifications are given.

Citation Download Citation

Adam Brunton, Julian Cashmore, Peter Elbourn, Graeme Elliner, Malcolm C. Gower, Philipp Grunewald, M. Harman, S. Hough, N. McEntee, S. Mundair, D. Rees, P. Richards, V. Truffert, Ian Wallhead, and Mike Whitfield "High-resolution EUV microstepper tool for resist testing and technology evaluation", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.548343

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